ISHIKAWA Yasuaki
   Department   Aoyama Gakuin University  Department of Electrical Engineering and Electronics, College of Science and Engineering
   Position   Professor
Language English
Publication Date 2018/05
Type Academic Journal
Peer Review Peer reviewed
Title Dimethylaluminum hydride for atomic layer deposition of Al2O3 passivation of amorphous InGaZnO thin-film transistors
Contribution Type Collaboration
Journal Appl. Phys. Express
Journal TypeAnother Country
Volume, Issue, Page 11,pp.061103-1-5
Author and coauthor Dianne C. Corsino, Juan Paolo S. Bermundo, Mami N. Fujii, Kiyoshi Takahashi, Yasuaki Ishikawa, and Yukiharu Uraoka
DOI 10.7567/APEX.11.061103