ISHIKAWA Yasuaki
   Department   Aoyama Gakuin University  Department of Electrical Engineering and Electronics, College of Science and Engineering
   Position   Professor
Language English
Publication Date 2012/07
Type Academic Journal
Peer Review Peer reviewed
Title Effects of Gate Insulator on Thin-Film Transistors with ZnO Channel Layer Deposited by Plasma-Assisted Atomic Layer Deposition
Contribution Type Collaboration
Journal J. Display Technol.
Journal TypeAnother Country
Volume, Issue, Page 9(9),pp.694-698
Author and coauthor Yumi Kawamura, Masahiro Horita, Yasuaki Ishikawa, and Yukiharu Uraoka
DOI 10.1109/JDT.2012.2213237