ISHIKAWA Yasuaki
   Department   Aoyama Gakuin University  Department of Electrical Engineering and Electronics, College of Science and Engineering
   Position   Professor
Language English
Publication Date 2018/10
Type Academic Journal
Peer Review Peer reviewed
Title Influence of ALD Precursors and High-Pressure Water Vapor Annealing on Al2O3/GaN MOS Capacitor Characteristics
Contribution Type Collaboration
Journal AIP Adv.
Journal TypeAnother Country
Volume, Issue, Page 8,pp.105103-1-6
Author and coauthor Mutsunori Uenuma, Kiyoshi Takahashi, Sho Sonehara, Yuta Tominaga, Yuta Fujimoto, Yasuaki Ishikawa, and Yukiharu Uraoka
DOI 10.1063/1.5041501