研究者情報 - 重里　有三

シゲサト　ユウゾウ SHIGESATO Yuuzou
重里　有三

所属

青山学院大学理工学部化学・生命科学科

職種教授

研究業績（学会発表）
1.	2025/12/10	“Differentiating the Wavefunctions of Valence and In-Gap States in p-type Semiconductors using Constant-Initial-State Photoelectron Yield Spectroscopy” (Materials Research Meeting 2025)
2.	2025/12/10	“Optical and structural properties of TiOxNy thin films deposited by High-Power Impulse Magnetron Sputtering (HiPIMS)” (Materials Research Meeting 2025)
3.	2025/12/09	“All solid-state thermal switchable devices consist of multilayer thin films including the Y-Mg alloy film controlled by hydro-/dehydrogenations” (Materials Research Meeting 2025)
4.	2025/12/09	“Approaches to fabricate the high-performance all-solid state electrochromic windows” (Materials Research Meeting 2025)
5.	2025/12/09	“Carrier generation in p-type NiO films deposited by RF magnetron sputtering using a NiO target”, (Materials Research Meeting 2025)
6.	2025/12/09	“Changes in electrical, optical and thermal properties of rf sputter-deposited NdNiO3 films induced by electrochemical hydro-/dehydrogenations” (Materials Research Meeting 2025)
7.	2025/12/09	“Hydrogen gas barrier properties of amorphous SiO2, SiNx and Al2O3 films evaluated using gasochromism of Pd loaded amorphous WO3 films” (Materials Research Meeting 2025)
8.	2025/12/09	“In-situ electrical, optical and thermal analyses on Pd catalyzed Tix-Mg1-x alloy films under gasochromic hydro-/dehydrogenations” (Materials Research Meeting 2025)
9.	2025/12/09	“In-situ thermal and optical analyses of Pd-catalyzed Y–Mg alloy thin films during electrochemical hydro/dehydrogenations in KOH solution” (Materials Research Meeting 2025)
10.	2025/12/09	“In-situ thermophysical analysis on metal or insulator states of GdHx thin films controlled by reversible electrochemical hydro-/dehydrogenations” (Materials Research Meeting 2025)
11.	2025/12/09	“Influence of attained vacuum pressure and N2 Introduction in the rf magnetron sputtering process to deposit p-type Cu2O films” (Materials Research Meeting 2025)
12.	2025/12/09	“Structural Changes of Y-Mg Alloy and Sm Hydride Thin Films during Gasochromic Hydrogenation Reaction Studied by In-Situ XRD/XRR” (Materials Research Meeting 2025)
13.	2025/12/09	“Temperature dependence of the hydro-/dehydrogenation reaction kinetics on switchable mirror Y-Mg and YMgHx films” (Materials Research Meeting 2025)
14.	2025/12/09	“Temperature dependence of the hydro-/dehydrogenation reaction processes of switchable mirror Ni-Mg films” (Materials Research Meeting 2025)
15.	2025/12/09	“Thermal conductivity control of SmHx and Sm-Mg films by electrochemical hydro/dehydrogenations in KOH solution” (Materials Research Meeting 2025)
16.	2025/12/09	“Thermal Conductivity of Amorphous Metal Oxide thin films from Vibron Transport Viewpoint” (Materials Research Meeting 2025)
17.	2025/12/09	“Tuning the Transition Temperature of VO2 Films via Applied Stress” (Materials Research Meeting 2025)
18.	2025/10/22	“New evaluation method on various gas barrier performances using functional oxide films (1); O2 or H2O barrier properties” (TCM-TOEO 2025)
19.	2025/10/22	“New evaluation methods on various gas barrier performances using functional oxide films (2); Hydrogen gas barrier properties” (TCM-TOEO 2025)
20.	2025/09/09	「WO3薄膜の透過率変化を用いた水素バリア膜の性能評価(2) : 水素透過流束を用いた定量評価」 (第８６回応用物理学会秋季学術講演会)
21.	2025/09/09	「水素化/脱水素化反応にともなう金属–半導体相変化による光・電気・熱物性制御薄膜の開発(4) : NiMgHx薄膜における反応速度の温度依存性解析」 (第８６回応用物理学会秋季学術講演会)
22.	2025/09/09	「水素化／脱水素化にともなう金属-半導体相変化による光・電気・熱物性制御薄膜の開発 (3)：YMgHx薄膜における反応速度の温度依存性解析」 (第８６回応用物理学会秋季学術講演会)
23.	2025/09/09	「水素化／脱水素化反応にともなう金属-半導体相変化による光・電気・熱物性制御薄膜の開発 (1) : 透明導電膜の電気・熱伝導から熱スイッチの開発まで」 (第８６回応用物理学会秋季学術講演会)
24.	2025/09/09	「水素化／脱水素化反応にともなう金属-半導体相変化による光・電気・熱物性制御薄膜の開発 (5) : 水素化ガドリニウム薄膜の熱伝導率制御」 (第８６回応用物理学会秋季学術講演会)
25.	2025/09/09	「水素化／脱水素化反応にともなう金属-半導体相変化による光・電気・熱物性制御薄膜の開発 (8) : Pdを担持したMg並びにY–Mg合金の電気化学的操作による水素化／脱水素化反応」 (第８６回応用物理学会秋季学術講演会)
26.	2025/09/09	「水素化／脱水素化反応にともなう金属-半導体相変化による光・電気・熱物性制御薄膜の開発(2) : SmH2薄膜における反応速度の温度依存性解析」 (第８６回応用物理学会秋季学術講演会)
27.	2025/09/09	「水素化／脱水素化反応にともなう金属-半導体相変化による光・電気・熱物性制御薄膜の開発(6) : 水素化サマリウム薄膜の熱伝導率」 (第８６回応用物理学会秋季学術講演会)
28.	2025/09/09	「水素化／脱水素化反応にともなう金属-半導体相変化による光・電気・熱物性制御薄膜の開発(7) : ガスクロミック方式によるPd担持Ti-Mg合金薄膜の熱物性制御」 (第８６回応用物理学会秋季学術講演会)
29.	2025/09/09	「水素化／脱水素化反応にともなう金属–半導体相変化による光・電気・熱物性制御薄膜の開発(9) : NiO, NdNiO3薄膜の電気化学的手法による物性制御」 (第８６回応用物理学会秋季学術講演会)
30.	2025/01/24	ガスクロミズムによるSm薄膜の水素化／脱水素化反応による熱スイッチの開発 (第11回透明酸化物光・電子材料研究会)
31.	2024/10/29	KOH電解液中で電気化学的に水素化・脱水素化を制御したPd担持水素化サマリウム（Pd/SmHx）薄膜のその場熱伝導率計測 (第45回日本熱物性シンポジウム)
32.	2024/10/29	N2-3%H2ガスによるSm膜の水素化および脱水素化制御と電気伝導率および熱伝導率の変化（Ⅱ）水素導入反応性スパッタによるSmHx膜の直接成膜 (第45回日本熱物性シンポジウム)
33.	2024/10/29	Pd触媒担持MgHx薄膜のN2-3%H2ガス中でのin-situサーモリフレクタンス法による熱伝導率解析 (第45回日本熱物性シンポジウム)
34.	2024/10/29	反応性スパッタで成膜したPd担持水素化ガドリニウム（GdHx）薄膜の電気化学的な水素化・脱水素化反応に伴う熱特性変化 (第45回日本熱物性シンポジウム)
35.	2024/10/29	高圧における水素化マグネシウム系固体水素貯蔵材の第一原理熱伝導解析 (第45回日本熱物性シンポジウム)
36.	2024/09/27	Independent control of the valence band maximum and conduction band minimum of amorphous Cd-In-Ga-O thin film by adjustment of Cd and Ga concentration (Transparent Conductive Oxides–Fundamentals and Applications(TCO2024))
37.	2024/09/27	Observation of in-gap state in Cu2O thin films using constant initial and final states yield spectroscopy (Transparent Conductive Oxides–Fundamentals and Applications(TCO2024))
38.	2024/09/27	p-type Cu2O films deposited by RF sputtering usig Cu or Cu2O targets (Transparent Conductive Oxides–Fundamentals and Applications(TCO2024))
39.	2024/07/07	Emerging Thermal Switching Materials (Chinese Materials Conference 2024 and World Materials Conference 2024　(CMC2024 & WMC2024))
40.	2024/07/07	High-performance very-thin thermochromic VO2 films deposited by magnetron sputtering (Chinese Materials Conference 2024 and World Materials Conference 2024　(CMC2024 & WMC2024))
41.	2024/07/07	Various functional oxide films with high performances deposited by reactive sputtering (Chinese Materials Conference 2024 and World Materials Conference 2024　(CMC2024 & WMC2024))
42.	2024/06/26	調光ミラー薄膜の水素化・脱水素化反応による熱スイッチの開発 (水素化学技術連携研究会前期研究会)
43.	2024/01/26	Gd調光ミラー薄膜の水素化・脱水素化反応のin-situ熱物性解析 (第7回透明酸化物光・電子材料研究会)
44.	2023/12/13	Changes in electrical and optical properties of NiOx and NdNiO3 films by electrochromic reactions (Materials Research Meeting 2023)
45.	2023/12/13	Direct Observation of Weak In-gap States of Cu2O and CuO Thin Films Studied via Constant Final State Yield Spectroscopy (Materials Research Meeting 2023)
46.	2023/12/13	Gas sensing properties of WO3 films deposited by reactive rf sputtering (Materials Research Meeting 2023)
47.	2023/12/13	Optical, electrical and thermophysical properties changes by UV irradiation for yttrium oxyhydride films (Materials Research Meeting 2023)
48.	2023/12/13	Structural and optical properties of niobium oxide films deposited by the specially designed reactive sputtering system (Materials Research Meeting 2023)
49.	2023/12/13	Structural and optical properties of niobium oxide films deposited by the specially designed reactive sputtering system (Materials Research Meeting 2023)
50.	2023/12/13	Temperature dependence of thermal conductivity of amorphous aluminum oxide thin films with different densities (Materials Research Meeting 2023)
51.	2023/12/12	Changes in electrical and thermal conductvities of Sm film by gasochromic hydrogenation and dehydrogenation (Materials Research Meeting 2023)
52.	2023/12/12	Electrical, thermophysical and structural properties change for Gd hydrides thin films controlled by gasochromic hydro-/dehydrogenation (Materials Research Meeting 2023)
53.	2023/12/12	Fabrication of all-solid-state thin film thermal switches using hydro-/dehydrogenation reactions of Y-Mg or Ni-Mg switchable mirror films (Materials Research Meeting 2023)
54.	2023/12/12	Hydrogen-gasochromic properties of Y-Mg, Ni-Mg, Mn-Mg and Gd switchable mirror films (Materials Research Meeting 2023)
55.	2023/12/12	Reversible electrical and thermal conductivities change of Pd-catalyzed Co-Mg films by gasochromic hydrogenation using N2-H2 (3%) gas (Materials Research Meeting 2023)
56.	2023/12/12	Thermal conductivity changes of electrochemically hydrogenated and dehydrogenated Pd-catalyzed Ni-Mg alloy thin film (Materials Research Meeting 2023)
57.	2023/11/07	3％H2-N2ガスによるSm膜の水素化および脱水素化制御と電気伝導率および熱伝導率の変化 (第44回日本熱物性シンポジウム)
58.	2023/11/07	N2-3%H2ガスを用いたPd触媒担持Co-Mg合金薄膜の熱伝導率スイッチング (第44回日本熱物性シンポジウム)
59.	2023/09/13	Large thermal conductivity switching ratio of Gd hydrides thin film with hydrogenation and dehydrogenation reactions (22nd European Conference on Thermophysical Properties (ECTP2023),)
60.	2023/09/13	Thermal conductivity changes of yttrium oxyhydride thin films induced by UV light photo-reduction (22nd European Conference on Thermophysical Properties (ECTP2023),)
61.	2022/12/05	Amorphous In-Ga-Mg-O thin film: Optical, Electrical Properties and TFT characteristics (第32回日本MRS)
62.	2022/12/05	H2 gas sensing at room temperature by transparent conductive oxide films (2); Al-doped ZnO (AZO) films top-coated with Pt or Pd deposited by magnetron sputtering (第32回日本MRS)
63.	2022/12/05	H2 gas sensing at room temperature by transparent conductive oxide films(1); Pt/SnO2 films deposited by magnetron sputtering (第32回日本MRS)
64.	2022/12/05	Hydrogen-gasochromic properties of Y-Mg and Ni-Mg switching mirror films (第32回日本MRS)
65.	2022/12/05	Study on thermal switches using the “switching mirror materials”; Hydrogenation/dehydrogenation of Ni-Mg alloy films using a 3% H2 in N2 gas (第32回日本MRS)
66.	2022/12/05	The all-solid-state thermal switches controlled by the hydro/dehydrogenations (第32回日本MRS)
67.	2022/10/26	Ar-H2(3%) ガスによる Y-Mg 合金薄膜の水素化・脱水素化に伴う可逆的な熱輸送キャリア変化（Ⅱ）XAFSによる Y 原子周囲の局所構造 (第43回日本熱物性シンポジウム)
68.	2022/10/26	Ar/H2混合ガスを用いたガスクロミック方式によるPd触媒を担持したGd薄膜の電気特性及び熱特性変化 (第43回日本熱物性シンポジウム)
69.	2022/10/26	Pd触媒を担持したNi-Mg合金薄膜の電気化学的に水素化・脱水素化した状態のその場熱伝導率計測 (第43回日本熱物性シンポジウム)
70.	2022/10/26	Pd触媒を有するNi-Mg合金薄膜のガスクロミック反応による電気伝導率および熱伝導率の挙動(Ⅱ) (第43回日本熱物性シンポジウム)
71.	2022/10/26	Y-Mg合金薄膜を用いた全固体型熱スイッチの開発 (第43回日本熱物性シンポジウム)
72.	2022/10/26	様々な局所構造を有するWO3薄膜の熱輸送特性に関する研究(Ⅱ) (第43回日本熱物性シンポジウム)
73.	2022/10/26	異なる密度のアモルファスAl2O3 薄膜における熱伝導率の温度依存性 (第43回日本熱物性シンポジウム)
74.	2022/10/26	紫外線によるイットリウム酸水素化物(YHO)薄膜の光還元特性とその熱伝導率への影響 (第43回日本熱物性シンポジウム)
75.	2022/09/26	Contribution of free electrons to thermal conductivity changes for Pd-catalyzed Mg-Ni alloy films by the hydrogenation (The 13th Asian Thermophysical Properties Conference (ATPC 2022))
76.	2022/09/26	Crystallization behavior of amorphous MoO3 films by post-annealing or flash-lamp irradiation (The 13th Asian Thermophysical Properties Conference (ATPC 2022))
77.	2022/09/26	Electrical and thermal character changes for Gd thin film by Gaschromic method using a H2/Ar mixed Gas. (The 13th Asian Thermophysical Properties Conference (ATPC 2022))
78.	2022/09/26	Heat transport properties for amorphous and polycrystalline WO3 films (The 13th Asian Thermophysical Properties Conference (ATPC 2022))
79.	2022/09/26	Study on the Zn-In-O-N films deposited by sputtering (The 13th Asian Thermophysical Properties Conference (ATPC 2022))
80.	2022/09/26	The effect of film structure on the thermal conductivity for Al2O3 thin films prepared by sputtering method (The 13th Asian Thermophysical Properties Conference (ATPC 2022))
81.	2022/09/26	Thermal and structural characters for Y-Mg alloys thin film in hydrogenation and dehydrogenation states (The 13th Asian Thermophysical Properties Conference (ATPC 2022))
82.	2022/09/20	酸化物半導体薄膜を用いた室温近傍での水素ガスセンシング(１)；Ptナノ粒子担持SnO2薄膜による室温センシング (第83回応用物理学会秋季学術講演会)
83.	2022/09/20	酸化物半導体薄膜を用いた室温近傍での水素ガスセンシング(２)；SnO2薄膜のスパッタ成膜条件とガス検知特性 (第83回応用物理学会秋季学術講演会)
84.	2022/09/20	酸化物半導体薄膜を用いた室温近傍での水素ガスセンシング(３)；PtあるいはPdナノ粒子担持Al:ZnO薄膜によるガスセンシング (第83回応用物理学会秋季学術講演会)
85.	2022/04/26	Characteristic and Structural Modifications of TCO thin films by the Flash-lamp Annealing Process (The 13th Asian Thermophysical Properties Conference (ATPC 2022))
86.	2022/03/24	ガスクロミック反応によるスイッチングミラー薄膜の電気伝導および熱伝導率の制御 (第69回応用物理学会春季学術講演会)
87.	2021/12/16	Characteristic Modification of TCO thin films by Flash Lamp Irradiation (Materials Research Meeting 2021)
88.	2021/12/14	All-solid-state electrochromic devices using switchable mirror films (Materials Research Meeting 2021)
89.	2021/12/14	Amorphous WO3 Electrochromic Films with controlled high-rate deposition by Reactive-gas-flow sputter deposition (Materials Research Meeting 2021)
90.	2021/12/14	Crystallization of In2O3-based amorphous thin films and its influence on electrical properties (Materials Research Meeting 2021)
91.	2021/12/14	Density and thermal conductivity of amorphous Al2O3 films deposited by rf magnetron sputtering under the total gas pressure from 0.5 to 8.0 Pa (Materials Research Meeting 2021)
92.	2021/12/14	Development of flexible photocatalytic sheet with the retentional photo-induced hydrophilicity (Materials Research Meeting 2021)
93.	2021/12/14	Electrical and thermal conductivity changes of hydro- and dehydrogenated Y-Mg alloy thin film controlled by 3% H2 in Ar gas (Materials Research Meeting 2021)
94.	2021/12/14	Gas sensing properties of SnO2 films deposited by rf magnetron sputtering (Materials Research Meeting 2021)
95.	2021/12/14	Modal analysis of spectral thermal conductivity of amorphous oxide alloys (Materials Research Meeting 2021)
96.	2021/12/14	n-type and p-type SnOx thin films deposited by reactive sputtering (Materials Research Meeting 2021)
97.	2021/12/14	Preparation of Pd-catalyzed Mg-Ni films and thermal conductivity changes by the hydrogenation using Ar-H2 gas (Materials Research Meeting 2021)
98.	2021/12/14	Structural Control and Characterization of Molybdenum oxide thin films by post-treatment processes (Materials Research Meeting 2021)
99.	2021/12/14	Thermal Conductivity Changes of Gd-Based Thin Films by Electrochemical Hydrogenation/Dehydrogenation (Materials Research Meeting 2021)
100.	2021/12/14	Thermal conductivity of amorphous and polycrystalline WO3 films (Materials Research Meeting 2021)
101.	2021/12/14	Transparent Thin Film Heaters For Anti-fogging Window Applications (Materials Research Meeting 2021)
102.	2021/10/27	Ar-H2(3%) ガスによる Y-Mg 合金薄膜の水素化・脱水素化に伴う可逆的な熱輸送キャリア変化 (第42回日本熱物性シンポジウム)
103.	2021/10/27	Gd 系薄膜の電気化学的水素化/脱水素化状態の熱特性 (第42回日本熱物性シンポジウム)
104.	2021/10/27	ITO と AgPd を積層した車載用透明薄膜ヒーターの開発 (第42回日本熱物性シンポジウム)
105.	2021/10/27	Pd 触媒を有する Mg-Ni 合金薄膜のガスクロミック反応による電気伝導率および熱伝導率の挙動 (第42回日本熱物性シンポジウム)
106.	2021/10/27	アモルファスAl2O3薄膜における熱輸送機構に関する研究熱伝導率とスパッタ成膜時全圧との関係 (第42回日本熱物性シンポジウム)
107.	2021/10/27	様々な局所構造を有する WO3 薄膜の熱輸送特性に関する研究 (第42回日本熱物性シンポジウム)
108.	2021/05/25	Allen-Feldman理論に基づいた三元系アモルファス合金の熱伝導解析 (第58回日本伝熱シンポジウム)
109.	2020/12/11	SnOx薄膜の電気伝導機構及び欠陥・電子構造の評価 (第30回日本MRS年次大会)
110.	2020/10/30	Allen-Feldman 理論に基づいたアモルファスAl2O3の熱伝導率の密度依存性評価 (第41回日本熱物性シンポジウム)
111.	2020/03/12	Ioffe-Regel 境界定義がアモルファスAl₂O₃ 熱伝導率の計算値に及ぼす影響 (第67回応用物理学会春季学術講演会)
112.	2020/03/12	Ptナノ粒子担持SnO₂薄膜の水素ガスセンシング特性 (第67回応用物理学会春季学術講演会)
113.	2020/03/12	アモルファス酸化物薄膜の熱物性；(1)アモルファスAl₂O₃薄膜における熱伝導率制御 (第67回応用物理学会春季学術講演会)
114.	2020/03/12	アモルファス酸化物薄膜の熱物性；(2)アモルファス(AlxGa_1-x)₂O₃薄膜の熱伝導率 (第67回応用物理学会春季学術講演会)
115.	2020/01/17	スイッチングミラー薄膜の高性能化 (第86回研究会)
116.	2020/01/17	反応性スパッタにより作製したα-MoO3薄膜の熱物性解析 (第86回研究会)
117.	2020/01/17	様々な元素をドープした酸化イリジウム薄膜のエレクトロクロミック特性 (第86回研究会)
118.	2019/12/12	Approaches to fabricate the all-solid-state electrochromic windows (Materials research Meeting 2019 (MRM2019))
119.	2019/12/12	Crystallization Behavior of Doped Amorphous Indium Oxide Films (Materials research Meeting 2019 (MRM2019))
120.	2019/12/12	Deposition of stoichiometric MgF₂ films by rf magnetron sputtering (Materials research Meeting 2019 (MRM2019))
121.	2019/12/12	Development of electrochromic thin films for thermal switching devices (Materials research Meeting 2019 (MRM2019))
122.	2019/12/12	Dielectric Function of Slightly-reduced Molybdenum Oxide (MoO_3-x) Films Diposited by Reactive Sputtering (Materials research Meeting 2019 (MRM2019))
123.	2019/12/12	Electrical and Optical Properties of Nb-doped TiO₂ Films Deposited by Reactive Sputtering Using Ni-Ti alloy target with impedance control systems (Materials research Meeting 2019 (MRM2019))
124.	2019/12/12	Electrochromic properties of doped IrO₂ films deposited by co-sputtering (Materials research Meeting 2019 (MRM2019))
125.	2019/12/12	Evaluation of gas barrier properties for amorphous AnSnO_x and SiN_x using transparent conductive oxide films (Materials research Meeting 2019 (MRM2019))
126.	2019/12/12	Gas sensing properties of SnO films deposited by rf magnetron sputtering (Materials research Meeting 2019 (MRM2019))
127.	2019/12/12	Gd and Gd-Mg alloy films deposited by sputtering for all-solid state switchable mirror devices (Materials research Meeting 2019 (MRM2019))
128.	2019/12/12	H₂ gas sensing properties of Al-doped ZnO films deposited by rf magnetron sputtering (Materials research Meeting 2019 (MRM2019))
129.	2019/12/12	Optical properties of TiO₂, TiO_2-x and Nb-doped TiO₂ films analyzed by scanning ellipsometry (Materials research Meeting 2019 (MRM2019))
130.	2019/12/12	Piezoelectric properties of the doped ZnO and AlNx films deposited by rf co-sputtering (Materials research Meeting 2019 (MRM2019))
131.	2019/12/12	Polytetrafluoroethylene (Teflon) films deposited by rf magnetron sputtering (Materials research Meeting 2019 (MRM2019))
132.	2019/12/12	Study of MoO₃ thin film with low thermal conductivity (Materials research Meeting 2019 (MRM2019))
133.	2019/12/12	Thermal conductivity of polycrystalline rutile Ti_1-xSnxO₂ films (Materials research Meeting 2019 (MRM2019))
134.	2019/12/12	Thermal Conductivity of Ti or W-doped Diamond-like carbon thin films (Materials research Meeting 2019 (MRM2019))
135.	2019/12/12	Thermophysical and optical properties of Al₂O₃-based amorphous complex oxides films deposited by co-sputtering (Materials research Meeting 2019 (MRM2019))
136.	2019/12/12	Thermophysical property of Y-Mg alloy switchable mirror thin films (Materials research Meeting 2019 (MRM2019))
137.	2019/12/12	TiO₂/WO₃ multi-layered photocatalyst with the metallic nano-particles as co-catalyst (Materials research Meeting 2019 (MRM2019))
138.	2019/12/12	Transparent diamond-like carbon films deposited by sputtering (Materials research Meeting 2019 (MRM2019))
139.	2019/11/29	3 Layered SiO₂/TiO₂/ZTO Films Deposited on PET or PI Substrates for the Flexible Photocatalytic Sheet with the Retentional Photo-induced Hydrophilicity (The 3rd International Symposium on Recent Progress of Energy and Environmental Photocatalysis (Photocatalysis 3))
140.	2019/11/29	Co-catalyst Loaded WO₃, TiO₂/WO₃ Multi-Layered Photocatalysts Deposited by Reactive Sputtering (The 3rd International Symposium on Recent Progress of Energy and Environmental Photocatalysis (Photocatalysis 3))
141.	2019/10/30	GaまたはInを含むAl₂O₃系アモルファス酸化物薄膜の熱伝導率 (第40回日本熱物性シンポジウム)
142.	2019/10/30	α-MoO₃薄膜の積層方向熱伝導率におけるサイズ効果の検討 (第40回日本熱物性シンポジウム)
143.	2019/10/30	全率固溶チタンスズ複合酸化膜の熱伝導率-置換カチオンサイトによるフォノン散乱の影響- (第40回日本熱物性シンポジウム)
144.	2019/10/30	酸化タングステン薄膜の酸化還元制御と熱伝導率の評価 (第40回日本熱物性シンポジウム)
145.	2019/10/29	Y-Mg スイッチングミラー薄膜のその場サーモリフレクタンス測定 (第40回日本熱物性シンポジウム)
146.	2019/10/07	Doping Effects on Anodic Electrochromic IrO₂ and NiO Films (11th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-11))
147.	2019/10/07	Experimental Observation on Crystallization of Amorphous ITO, IZO, and IGZO Films using Synchrotron Radiation (11th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-11))
148.	2019/10/07	Fabrication of the Photocatalytic Sheet; How to Deposit High Quality TiO₂ Photocatalyst on PET or PI Polymer Films by Reactive Sputtering (11th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-11))
149.	2019/10/07	Metallic Nanoparticle Loaded WO₃, TiO₂/WO₃ Photocatalytic Films for Visible-Light Activities (11th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-11))
150.	2019/10/07	Optical and Mechanical Properties of The Transparent Diamond-Like Carbon Films (11th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-11))
151.	2019/10/07	Small Polaron Sbsorption of Slightly-Reduced Amorphous WO_3-x, MoO_3-x and W_yMo_1-yO_3-x Films (11th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-11))
152.	2019/10/07	Structure, Stoichiometry and Optical Properties of MgF₂ Films Deposited by Sputtering (11th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-11))
153.	2019/10/07	The new Method to Characterize Gas Barrier Properties using Transparent Conductive Oxide Films (11th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-11))
154.	2019/09/20	GdおよびGd-Mgスイッチングミラー薄膜の高性能化 (第80回応用物理学会秋季学術講演会)
155.	2019/09/20	rfスパッタリングによるMgF₂薄膜の作製と誘電関数解析 (第80回応用物理学会秋季学術講演会)
156.	2019/09/20	コ・スパッタリングによるMgをドープしたIrO₂薄膜のエレクトロクロミック特性 (第80回応用物理学会秋季学術講演会)
157.	2019/09/20	反応性スパッタリングで成膜したNb, N添加TiO₂膜の局所構造 (第80回応用物理学会秋季学術講演会)
158.	2019/09/19	H+インターカレーションによるY-Mg合金薄膜の熱スイッチング挙動 (第80回応用物理学会秋季学術講演会)
159.	2019/09/19	ITO, IZO, AZOを用いたガスバリア膜特性の評価 (第80回応用物理学会秋季学術講演会)
160.	2019/09/19	アモルファスMgO_3-x並びにWyM_1-yO_3-x薄膜の光学特性と誘電関数 (第80回応用物理学会秋季学術講演会)
161.	2019/09/19	酸化タングステン(WO_3-x)薄膜の構造と特性(1)：電子格子相互作用と誘電関数 (第80回応用物理学会秋季学術講演会)
162.	2019/09/19	酸化タングステン(WO_3-x)薄膜の構造と特性(2)：様々な還元状態における熱伝導率 (第80回応用物理学会秋季学術講演会)
163.	2019/09/18	アモルファスAl₂O₃薄膜における熱伝導率制御 (第80回応用物理学会秋季学術講演会)
164.	2019/09/04	光誘起親水性の暗所維持特性を有するフレキシブル高性能光触媒シートの開発 (VACUUM2019真空展)
165.	2019/01/18	アモルファス酸化インジウム系薄膜の結晶化 (第82回研究会)
166.	2019/01/18	ガスバリア膜を用いたフレキシブル光触媒シートの開発 (第82回研究会)
167.	2018/12/18	Optical properties of amorphous Cd-In-O film evaluated by ellipsometry method. (第28回日本MRS年次大会)
168.	2018/12/18	Ptナノ粒子と担持した可視光応答型WO₃光触媒薄膜に関する研究 (第28回日本MRS年次大会)
169.	2018/12/18	アモルファスDLC薄膜のラマンスペクトルと熱物性に及ぼすTiドーパントの影響 (第28回日本MRS年次大会)
170.	2018/12/18	アモルファスIGZOトランジスタにおける欠陥構造と電子構造の関係性の解明 (第28回日本MRS年次大会)
171.	2018/12/18	アモルファスIn₂O₃系薄膜の結晶化に関する研究」 (第28回日本MRS年次大会)
172.	2018/12/18	スパッタ法で作製したヘテロエピタキシャルITOおよびIn₂O₃薄膜の電気特性と熱物性 (第28回日本MRS年次大会)
173.	2018/12/18	スパッタ法を用いた作製してZn-InO-N薄膜の構造特性と光学特性 (第28回日本MRS年次大会)
174.	2018/12/18	モルファス(AlxGa_1-x)₂O₃の熱物性及び工学特性 (第28回日本MRS年次大会)
175.	2018/12/18	ルチル型全率固溶体Ti_1-xSn_xO₂薄膜の格子定数、光学的バンドギャップおよび熱物性 (第28回日本MRS年次大会)
176.	2018/12/18	反応性スパッタリングを用いたαおよびβ-MoO₃薄膜の作製とその熱物性 (第28回日本MRS年次大会)
177.	2018/12/18	還元したアモルファス参加タングステン(WO₃_-x)薄膜の誘電関数」 (第28回日本MRS年次大会)
178.	2018/11/13	「(Al_xGa_1-x)₂O₃複合アモルファス薄膜における熱拡散率の組成依存性」 (第36回日本熱物性シンポジウム)
179.	2018/11/13	「Tiドープダイヤモンドライクカーボン薄膜における化学組成と熱伝導率(2)-基板加熱が酸素不純物と熱伝導率に与える影響-」 (第36回日本熱物性シンポジウム)
180.	2018/11/13	「α型およびβ型MoO3多結晶薄膜の熱伝導率」 (第36回日本熱物性シンポジウム)
181.	2018/11/13	「チタン-スズ複合酸化膜の熱伝導率と組成依存性」 (第36回日本熱物性シンポジウム)
182.	2018/11/13	「ヘテロエピタキシャルIn₂O₃薄膜における熱と電気の輸送特性」 (第36回日本熱物性シンポジウム)
183.	2018/11/13	「熱流方向と平行な結晶粒界におけるフォノン錯乱の熱伝導率への影響」 (第36回日本熱物性シンポジウム)
184.	2018/10/21	Control on the interface between thin film TiO₂ photocatalyst and PET, PI substrates (ACSIN-14& ICSPM26)
185.	2018/10/21	IrO_x based Electrochromic films deposited by rf suputtering (ACSIN-14& ICSPM26)
186.	2018/10/21	Switchable mirror materials based on Gd-Mg alloy deposited by sputtering (ACSIN-14& ICSPM26)
187.	2018/10/14	Effects of the Al doping on thermal conductivity for heteroepitaxially grown Al-doped ZnO films (7th International Symposium on Transparent Conductive Materials (IS-TCMs))
188.	2018/10/14	Local structure of Nb and/or N doped TiO₂ film formed by reactive sputtering (7th International Symposium on Transparent Conductive Materials (IS-TCMs))
189.	2018/10/14	Optical properties of niobium oxide films deposited by reactive sputtering with the plasma emission feedback system (7th International Symposium on Transparent Conductive Materials (IS-TCMs))
190.	2018/09/18	「rfスパッタリングによるIrO_x系エレックトロクロミック薄膜の作製」 (第79回応用物理学会秋季学術講演会)
191.	2018/09/18	「アモルファスITOおよびIGZO薄膜の結晶化に関する研究」 (第79回応用物理学会秋季学術講演会)
192.	2018/09/05	「反応性スパッタによるITO並びにIZO透明導電膜の高速成膜」 (VACUUM2018 真空展)
193.	2018/09/03	「反応性スパッタリングによりNb，N ドープしたTiO₂膜の局所構造」 (第21回XAFS討論会)
194.	2018/07/29	High Quality TiO₂ Photocatalyst Deposited on PET or PI Polymer Films by Reactive Sputtering for Flexible Photocatalytic Sheet (The 22nd International Conference on Photochemical Conversion and Storage of Solar Energy (IPS-22))
195.	2018/04/02	Fabrication of p-type SnO_x Thin Films and its Defect Structure (MRS Spring Meeting 2018)
196.	2018/03/17	「Gd並びにMg-Y薄膜のスイッチングミラー特性の高性能化」 (第65回応用物理学会春季学術講演会)
197.	2018/03/17	「スパッタ法によるAl_1-xGa_xNの成膜」 (第65回応用物理学会春季学術講演会)
198.	2017/12/05	「反応性スパッタリングによる金属ドープTiO₂およびTiO_2-X膜の光学特性」 (第27回MRS年次大会)
199.	2017/11/26	Experimental Investigation on Structural Evolution of Amorphous Indium-Based Oxide Films During Annealing by In Situ XRD and EXAFS Measurements (2017MRS Fall Meeting & Exhibit)
200.	2017/11/26	Structural Characterization of Functional ZnO-InN Alloy Films (2017MRS Fall Meeting & Exhibit)
201.	2017/11/26	Structural, Optical and Electrical Properties of Zn₃N₂ Films Deposited by dc or rf Magnetron Sputtering (2017MRS Fall Meeting & Exhibit)
202.	2017/11/07	「TiO₂(001)基板に作製したエピタキシャルVO₂の膜成長と熱伝導率」 (第38回日本熱物性シンポジウム)
203.	2017/11/07	「Tiドープダイヤモンドライクカーボン薄膜における化学組成と熱伝導率」 (第38回日本熱物性シンポジウム)
204.	2017/11/07	「エピタキシャルZnO薄膜におけるフォノン熱伝導率の結晶性方位依存性」 (第38回日本熱物性シンポジウム)
205.	2017/11/07	「ヘテロエピタキシャルITO薄膜における熱と電気の輸送特性」 (第38回日本熱物性シンポジウム)
206.	2017/10/01	Electrochromic WO₃ Films with controlled high-rate deposition by Hollow Cathode Gas Flow Sputtering (The 232nd Electrochemical Society (ECS) MEETING)
207.	2017/09/05	「ダイヤモンドライクカーボン薄膜中のTiドーパントによる熱伝導率への影響」 (第78回応用物理学会秋季学術講演会)
208.	2017/09/05	「ヘテロエピタキシャルITO薄膜における熱伝導率の結晶方位依存性」 (第78回応用物理学会秋季学術講演会)
209.	2017/09/05	「ポリマーフィルムを用いた高機能フレキシブルTiO₂光触媒薄膜の作製」 (第78回応用物理学会秋季学術講演会)
210.	2017/09/05	「後焼成によるアモルファスIGZO薄膜の欠陥変化及びそのメカニズム」 (第78回応用物理学会秋季学術講演会)
211.	2017/09/05	「還元された酸化タングステン(WO3-x)薄膜の誘電関数」 (第78回応用物理学会秋季学術講演会)
212.	2017/09/03	Thermal Conductivity of Epitaxial VO₂ Film at The Metal-Insulator Phase Transition (European Conference on Thermophysical Properties (ECTP 21st 2017))
213.	2017/08/27	Characterization of heteroepitaxial grown ITO films deposited by sputtering (IUMRS-ICAM 2017 Symposium B-1 (3rd Bilateral MRS-J / E-MRS symposium))
214.	2017/08/27	Characterization of Layered In₂O₃(ZnO)_m Films (IUMRS-ICAM 2017 Symposium B-1 (3rd Bilateral MRS-J / E-MRS symposium))
215.	2017/08/27	Characterization of Si or Ti-doped diamond-like carbon films (IUMRS-ICAM 2017 Symposium B-1 (3rd Bilateral MRS-J / E-MRS symposium))
216.	2017/08/27	Crystal structure control of TiO₂ films deposited by reactive sputtering (IUMRS-ICAM 2017 Symposium B-1 (3rd Bilateral MRS-J / E-MRS symposium))
217.	2017/08/27	Deposition of Niobium Oxide films by reactive sputtering with the plasma emission monitoring system (IUMRS-ICAM 2017 Symposium B-1 (3rd Bilateral MRS-J / E-MRS symposium))
218.	2017/08/27	Dielectricconstant and work function of tungsten oxide (WO_3-x) films (IUMRS-ICAM 2017 Symposium B-1 (3rd Bilateral MRS-J / E-MRS symposium))
219.	2017/08/27	Electrical and thermal conductivity change for epitaxial VO₂ film at the metal-insulator phase transition (IUMRS-ICAM 2017 Symposium B-1 (3rd Bilateral MRS-J / E-MRS symposium))
220.	2017/08/27	Experimental investigation on crystallization of In₂O₃ based amorphous transparent conductive oxide films (IUMRS-ICAM 2017 Symposium B-1 (3rd Bilateral MRS-J / E-MRS symposium))
221.	2017/08/27	Fabrication of graphene and molybdenum oxide hybrid films for transparent conductive films (IUMRS-ICAM 2017 Symposium B-1 (3rd Bilateral MRS-J / E-MRS symposium))
222.	2017/08/27	Gd and Mg-Y switching mirror materials deposited by sputtering (IUMRS-ICAM 2017 Symposium B-1 (3rd Bilateral MRS-J / E-MRS symposium))
223.	2017/08/27	Optical, electrical, and thermophysical properties of heteroepitaxial grown Al-doped ZnO (AZO)” K. Honda (IUMRS-ICAM 2017 Symposium B-1 (3rd Bilateral MRS-J / E-MRS symposium))
224.	2017/08/27	Phase Stability of Sn doped TiO₂ studied by X-ray Absorption Spectroscopy and First-Principles DFT Calculations (IUMRS-ICAM 2017 Symposium B-1 (3rd Bilateral MRS-J / E-MRS symposium))
225.	2017/08/27	Photocatalytic TiO₂ films deposited on flexible polymer substrates by reactive sputtering (IUMRS-ICAM 2017 Symposium B-1 (3rd Bilateral MRS-J / E-MRS symposium))
226.	2017/08/27	Reactive sputter deposition of n-type and p-type SnO_x films (IUMRS-ICAM 2017 Symposium B-1 (3rd Bilateral MRS-J / E-MRS symposium))
227.	2017/08/27	Reactive sputter deposition of Nb-doped TiO₂ films using Ni-Ti alloy target with impedance control systems (IUMRS-ICAM 2017 Symposium B-1 (3rd Bilateral MRS-J / E-MRS symposium))
228.	2017/08/27	Structural characterization of GaN films deposited by rf sputtering using He, Ne, Ar, and Kr as sputtering gases (IUMRS-ICAM 2017 Symposium B-1 (3rd Bilateral MRS-J / E-MRS symposium))
229.	2017/08/27	Study on the Zn-In-O-N(SION) films deposited by dc or rf sputtering (IUMRS-ICAM 2017 Symposium B-1 (3rd Bilateral MRS-J / E-MRS symposium))
230.	2017/08/27	Tailoring Crystal Structural of Sputtered TiO₂ Film by Impurity Doping (IUMRS-ICAM 2017 Symposium B-1 (3rd Bilateral MRS-J / E-MRS symposium))
231.	2017/08/27	Thermal conductivity of Ti-doped diamond-like carbon thin fims (IUMRS-ICAM 2017 Symposium B-1 (3rd Bilateral MRS-J / E-MRS symposium))
232.	2017/08/27	Zn₃N₂ films deposited by dc or rf magnetron sputtering (IUMRS-ICAM 2017 Symposium B-1 (3rd Bilateral MRS-J / E-MRS symposium))
233.	2017/07/03	Dielectric function of Nb-TiO₂ and TiO_2-x films by reactive sputtering (10th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics(TOEO-10))
234.	2017/07/03	n-type and p-type SnO_x films deposited by reactive sputtering with the impedance control system (10th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics(TOEO-10))
235.	2017/07/03	Niobium Oxide films with precisely controlled various stoichiometry deposited by reactive sputtering with the plasma emission monitoring system (10th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics(TOEO-10))
236.	2017/07/03	Structural, optical and electrical properties of sputtered (ZnO) _x (InN)_1−x Films (10th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics(TOEO-10))
237.	2017/07/03	「スイッチングミラー材料Gd, Mg-Yを用いたスマートウィンドウの開発」 (第6回JACI/GCSシンポジウム)
238.	2017/07/03	「スパッタ成膜したGaNのキャラクタリゼーション」 (第6回JACI/GCSシンポジウム)
239.	2017/07/03	「ポリマーフィルムを用いたフレキシブルTiO2光触媒薄膜の作製」 (第6回JACI/GCSシンポジウム)
240.	2017/04/17	Thermal conduction in homologous In₂O₃(ZnO)_m films (2017 MRS Spring Meeting & Exhibit)
241.	2017/04/17	Thermal conductivities of epitaxial Al-doped and ZnO thin films deposited by magnetron sputtering (2017 MRS Spring Meeting & Exhibit)
242.	2017/04/17	TiO₂ Film as Visible-Light Active Photocatalyst by Designing the Multilayer Structure with WO₃ Film (2017 MRS Spring Meeting & Exhibit)
243.	2017/03/14	「DC及びRFスパッタ法によるZn3N2薄膜の合成」 (第64回応用物理学会春季学術講演会)
244.	2017/03/14	「反応性コ・スパッタ法によるZn-In-O-N(ZION)の成膜」 (第64回応用物理学会春季学術講演会)
245.	2017/03/14	「層状構造を持つIn₂O₃(ZnO)m薄膜の熱伝導率」 (第64回応用物理学会春季学術講演会)
246.	2017/01/27	「In₂O₃(ZnO)_m薄膜の熱電特性及び評価方法」 (第74回研究会)
247.	2016/12/19	Deposition of Niobium Oxide films by reactive sputtering with the plasma emission feedback system in the transition region (26th Annual Meeting of MRS-Japan 2016 (MRS-J))
248.	2016/12/19	High rate diposition of n-type and p-type SnOx films deposited by reactive magnetron sputtering with unipolar pulsing and impedance control system (26th Annual Meeting of MRS-Japan 2016 (MRS-J))
249.	2016/12/19	Selective deposition of polycrystalline anatase TiO₂ films by reactive sputtering with Nb or N dopings (26th Annual Meeting of MRS-Japan 2016 (MRS-J))
250.	2016/12/19	Selective deposition of polycrystalline rutile TiO₂ films by reactive sputtering with controlling deposition parameters or Sn-doping (26th Annual Meeting of MRS-Japan 2016 (MRS-J))
251.	2016/12/19	Study on ZnO-InN(ZnInON) films as the functional oxynitride materials (26th Annual Meeting of MRS-Japan 2016 (MRS-J))
252.	2016/12/19	Synthesis of Zn₃N₂ fils by DC and RF magnetron sputtering (26th Annual Meeting of MRS-Japan 2016 (MRS-J))
253.	2016/12/19	Transparent conductive ITO films deposited by reactive sputtering with plasma emission feedback system (26th Annual Meeting of MRS-Japan 2016 (MRS-J))
254.	2016/12/19	「DC/RFコ・スパッタリングにより作製したSi-DLC薄膜とTi-DLC薄膜」 (第26回日本MRS年次大会)
255.	2016/12/19	「スイッチングミラー材料を使用したスマートウィンドウの開発」 (第26回日本MRS年次大会)
256.	2016/12/02	「スパッタ法によるTiO₂/WO₃積層系可視光応答型光触媒の作製II」 (第23回シンポジウム「光触媒反応の最近の展開」)
257.	2016/12/02	「反応性スパッタ法により作製したIn_1-xGa_xN薄膜のバンドギャップ制御」 (第23回シンポジウム「光触媒反応の最近の展開」)
258.	2016/12/02	「金属GaあるいはGaNをターゲットとして用いたスパッタ法によるGaN薄膜の作製」 (第23回シンポジウム「光触媒反応の最近の展開」)
259.	2016/11/28	「AlドープZnO(AZO)薄膜の熱伝導率におけるドーパントの影響」 (第37回日本熱物性シンポジウム)
260.	2016/11/28	「エピタキシャルVO₂薄膜における金属・絶縁体相転移による熱伝導率変化の発現条件」 (第37回日本熱物性シンポジウム)
261.	2016/11/28	「ホモロガスIn₂O₃(ZnO)_m薄膜中の熱伝導現象」 (第37回日本熱物性シンポジウム)
262.	2016/11/27	Thin-Film WO₃ Photocatalyst with Visible Light Activity; (1) Deposition by the conventional reactive sputtering (2016 MRS Fall Meeting & Exhibit)
263.	2016/11/27	Thin-Film WO₃ Photocatalyst with Visible Light Activity; (2) Deposition by the hollow cathode gas flow sputtering (2016 MRS Fall Meeting & Exhibit)
264.	2016/09/13	• 「ヘテロエピタキシャル成長したVO2薄膜の熱伝導率と金属絶縁体相転移」 (第77回応用物理学会秋季学術講演会)
265.	2016/09/13	• 「ホモロガス構造をもつIn2O3(ZnO)m薄膜の熱物性」 (第77回応用物理学会秋季学術講演会)
266.	2016/09/13	「インピーダンス制御を用いた反応性スパッタ法によるn型およびp型SnOxの高速成膜」 (第77回応用物理学会秋季学術講演会)
267.	2016/09/13	「プラズマ発光制御を用いた反応性スパッタ法による酸化ニオブ(NbO_x)成膜」 (第77回応用物理学会秋季学術講演会)
268.	2016/09/13	「反応性スパッタ法によるTiO₂/WO₃積層系可視光応答型の成膜」 (第77回応用物理学会秋季学術講演会)
269.	2016/09/13	「反応性スパッタ法によるTiO₂薄膜の結晶構造制御(1)；成膜パラメータによる、あるいはSnドープによるルチルの選択成長」 (第77回応用物理学会秋季学術講演会)
270.	2016/09/13	「反応性スパッタ法によるTiO₂薄膜の結晶構造制御(2)；Nb,Nドープによるアナターゼの選択成長」 (第77回応用物理学会秋季学術講演会)
271.	2016/09/13	「多結晶およびエピタキシャルAlドープZnO(AZO)薄膜の熱伝導率」 (第77回応用物理学会秋季学術講演会)
272.	2016/09/13	「金属GaあるいはGaNをターゲットとしてもしいたスパッタ法によるGaN薄膜の成膜」 (第77回応用物理学会秋季学術講演会)
273.	2016/09/13	スパッタ法により作製したSi-DLCとTi-DLCのヂーパント効果」 (第77回応用物理学会秋季学術講演会)
274.	2016/09/12	Visible-light active thin-film WO₃ photocatalyst deposited by low-damage hollow-cathode reactive-gas-flow sputtering (15th International Conference on Plasma Surface Engineering (PSE2016))
275.	2016/09	「グラフェンをベースとする高性能透明導電膜の作製」 (兵庫県立大学シンポジウム)
276.	2016/05/02	Deposition of indium-oxide based transparent conductive films by reactive sputtering using alloy targets (European Materials Research Society(E-MRS) 2016 Spring Meeting)
277.	2016/05/02	Effect of V and Ga dopant on the structural and electrical properties of ZnO films (European Materials Research Society(E-MRS) 2016 Spring Meeting)
278.	2016/05/02	In-situ Brouwer analysis on defects in homologous In₂O₃(ZnO) films (European Materials Research Society(E-MRS) 2016 Spring Meeting)
279.	2016/05/02	Pt-loaded WO₃ photocatalyst with visible light activity deposited hollow-cathode reactive gas-flow sputtering (European Materials Research Society(E-MRS) 2016 Spring Meeting)
280.	2016/05/02	Thermal conductivity of polycrystalline VO₂ thin films across Metal-Insulator Transition (E)
281.	2016/03/19	a-IGZO薄膜の後焼成に伴う構造緩和と結晶化 (第63回応用物理学会春季学術講演会（共同）)
282.	2016/03/19	プラズマ発行制御を用いた反応性スパッタ法によるITOおよびIZO透明導電膜の成膜 (第63回応用物理学会春季学術講演会（共同）)
283.	2016/01/29	アモルファスのIGO,IZO,IGZO薄膜の結晶化挙動 (第70回研究会（日本学術振興会透明酸化物光・電子材料第166委員会）（共同）)
284.	2015/12/10	Change in Structure and TFT Performances of IZO, IGO and IGZO Films by Crystallization (The 22nd International Display Workshops (IDW’15)（共同）)
285.	2015/12/08	バナジウムと窒素をコドープした酸化チタンの成膜とキャラクタリセーション (第25回日本MRS年次大会（共同）)
286.	2015/12/08	ホロモガス構造を持つIn2O3(ZnO)5薄膜の電気と光学特性 (第25回日本MRS年次大会（共同）)
287.	2015/12/08	反応性スパッタによる(ZnO)_x(InN)_1-x薄膜の作製 (第25回日本MRS年次大会（共同）)
288.	2015/12/08	反応性スパッタ法で作製したGaN薄膜の構造と熱物性 (第25回日本MRS年次大会（共同）)
289.	2015/12/08	反応性スパッタ法により合成したInGaN薄膜の特性 (第25回日本MRS年次大会（共同）)
290.	2015/12/08	反応性スパッタ法によるNドープ、NbとNのコ・ドープしたTiO₂薄膜の作製 (第25回日本MRS年次大会（共同）)
291.	2015/12/08	反応性スパッタ法によるTiO₂/WO₃積層系可視光応答型光触媒の作製 (第25回日本MRS年次大会（共同）)
292.	2015/12/08	反応性スパッタ法による高品質ITO,IZO透明導電膜の作製 (第25回日本MRS年次大会（共同）)
293.	2015/12/08	反応性マグネトロンスパッタ法によるZnNx薄膜の合成 (第25回日本MRS年次大会（共同）)
294.	2015/10/19	Change in the structure and optical properties of IGZO films by crystallization (The 9th symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-9)（共同）)
295.	2015/10/19	Characterization of a-IGZO by Raman spectroscopy using total-internal-reflection technique (The 9th symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-9)（共同）)
296.	2015/10/19	Defect Mechanism of Homologous In₂O₃(ZnO)₅ Films (The 9th symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-9)（共同）)
297.	2015/10/19	Deposition of ITO and IZO transparent conductive films by reactive sputtering in “transition region” (The 9th symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-9)（共同）)
298.	2015/10/19	Engineering the TIO anode interface in organic photovoltaics for improving charge carrier extraction (The 9th symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-9)（共同）)
299.	2015/10/19	High-rate deposition of visible-light active thin-film WO₃ photocatalyst by low-damage reactive-gas-flow sputtering (The 9th symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-9)（共同）)
300.	2015/10/19	Optical and Electrical properties of Zn-In-O-N Films deposited by reactive sputtering (The 9th symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-9)（共同）)
301.	2015/10/19	Sn-doping Induced Structural Changes for Sputtered TiO2 Films (The 9th symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-9)（共同）)
302.	2015/10/19	Structural and optical properties of Nb-, N-doped and Nb-N co-doped TiO₂ films (The 9th symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-9)（共同）)
303.	2015/10/19	Thermophysical Properties of Tungsten Oxide Films with Different Crystallinity (The 9th symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-9)（共同）)
304.	2015/10/19	TiO₂/WO₃ Multi-layer Films for Visible Light-active Photocatalyst (The 9th symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-9)（共同）)
305.	2015/10/19	Tuning the transition temperature of VO₂ films deposited by reactive sputtering (The 9th symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-9)（共同）)
306.	2015/10/19	ZnN_x films deposited by reactive sputtering using He, Ne, Ar gases (The 9th symposium on Transparent Oxide and Related Materials for Electronics and Optics (TOEO-9)（共同）)
307.	2015/10/19	エピタキシャルGaN薄膜における熱伝導率へのスパッタ性膜条件の影響 (第36回日本熱物性シンポジウム（共同）)
308.	2015/08/21	透過型電子顕微鏡によるIGZO薄膜の結晶化過程観察 (2015年夏の電子顕微鏡解析技術フォーラム（日本顕微鏡学会）（共同）)
309.	2015/07/08	GaN and InGaN films deposited by reactive sputtering (The 13th International Symposium on Sputtering & Plasma Processes(ISSP2015)（共同）)
310.	2015/07/08	Study on the crystallization of amorphous IGZO thin films deposited by dc magnetron sputtering (The 13th International Symposium on Sputtering & Plasma Processes(ISSP2015)（共同）)
311.	2015/07/08	Thermophysical properties of epitaxial GaN films deposited by reactive sputtering using a Ga target (The 13th International Symposium on Sputtering & Plasma Processes(ISSP2015)（共同）)
312.	2015/07/08	Transparent conductive ITO and IZO films deposited by reactive sputtering using alloy targets with the plasma emission feedback system (The 13th International Symposium on Sputtering & Plasma Processes(ISSP2015)（共同）)
313.	2014/12/12	スパッタ法によるTiO₂/WO₃積層系可視光応答型光触媒の作製 (光機能材料研究会第21回シンポジウム「光触媒反応の最近の展開」（共同）)
314.	2014/12/10	Al or Ga doped ZnO Films with High Conductivity and Transparency Deposited by Off-axis Sputtering (The 1st E-MRS/MRS-J Bilateral Symposia（単独）)
315.	2014/12/10	Analysis on Carrier Density of the ITO Nanoparticles using Scanning Ellipsometry (The 1st E-MRS/MRS-J Bilateral Symposia（共同）)
316.	2014/12/10	Comparative study on the Long-term durability for the various TAOS films (The 1st E-MRS/MRS-J Bilateral Symposia（共同）)
317.	2014/12/10	Crystallization of amorphous IGZO thin films (The 1st E-MRS/MRS-J Bilateral Symposia（共同）)
318.	2014/12/10	Effect of the buffer layer on the properties of Al doped ZnO films deposited by reactive sputtering (The 1st E-MRS/MRS-J Bilateral Symposia（共同）)
319.	2014/12/10	High-rate reactive sputter deposition for Transparent Conductive Oxide Films (The 1st E-MRS/MRS-J Bilateral Symposia（共同）)
320.	2014/12/10	n-type or p-type SnO_x Films Deposited by Reactive Sputtering (The 1st E-MRS/MRS-J Bilateral Symposia（共同）)
321.	2014/12/10	Optical constants of Nb-doped TiO₂ films (The 1st E-MRS/MRS-J Bilateral Symposia（共同）)
322.	2014/12/10	Structure-property correlation of a-IGZO (The 1st E-MRS/MRS-J Bilateral Symposia（共同）)
323.	2014/12/10	Ta-doped SnO₂ films deposited by off-axis dc magnetron sputtering (The 1st E-MRS/MRS-J Bilateral Symposia（共同）)
324.	2014/12/10	Temperature dependence of Phonon or Free Electron Contribution on Thermal Conductivity of VO₂ Thin Films across Metal-Insulator Transition (The 1st E-MRS/MRS-J Bilateral Symposia（共同）)
325.	2014/12/10	The effect of impurity doping on crystal structure of TiO₂ films deposited by reactive sputtering (The 1st E-MRS/MRS-J Bilateral Symposia（共同）)
326.	2014/12/10	Thermal conductivities of Tungsten Oxide Thin films with Different Crystallinity (The 1st E-MRS/MRS-J Bilateral Symposia（共同）)
327.	2014/12/10	Thermal diffusivity of epitaxial GaN thin films deposited by reactive sputtering (The 1st E-MRS/MRS-J Bilateral Symposia（共同）)
328.	2014/12/10	Transparent conductive Nb-doped TiO₂ films deposited by reactive sputtering (The 1st E-MRS/MRS-J Bilateral Symposia（共同）)
329.	2014/12/10	Tuning of the transition temperature of VO₂ films by external-stress impression (The 1st E-MRS/MRS-J Bilateral Symposia（共同）)
330.	2014/12/10	Very high rate deposition of WO₃ Films Deposited by Hollow Cathode Gas Flow Sputtering for Electrochromic Applications (The 1st E-MRS/MRS-J Bilateral Symposia（単独）)
331.	2014/11/22	LaAlO₃(100)基板上のWO₃エピタキシャル薄膜の熱拡散率 (第35回日本熱物性シンポジウム（共同）)
332.	2014/11/22	Mo膜上およびサファイアC面上に成長させたVO₂薄膜の熱伝導率 (第35回日本熱物性シンポジウム（共同）)
333.	2014/11/22	エピタキシャルGaN薄膜の熱拡散率に対する結晶の配向性と酸素濃度依存性 (第35回日本熱物性シンポジウム（共同）)
334.	2014/10/12	Nitrogen induced crystallization in indium-tin-zinc-oxide thin film (5th International Symposium on Transparent Conductive Materials(TCMs2014)（共同）)
335.	2014/10/12	Potential gradients at surfaces, interfaces and grain boundaries of degenerately doped transparent conducting oxides (5th International Symposium on Transparent Conductive Materials(TCMs2014)（共同）)
336.	2014/10/12	Work function engineering of transparent conductive electrodes at the nanoscale (5th International Symposium on Transparent Conductive Materials(TCMs2014)（共同）)
337.	2014/09/17	アモルファスIZO,IGO,IGZO薄膜の結晶化(1)：IZOとIGO薄膜の結晶化挙動 (第75回応用物理学会秋季学術講演会（共同）)
338.	2014/09/17	アモルファスIZO,IGO,IGZO薄膜の結晶化(2)：IGZOの結晶化挙動とデバイス特性 (第75回応用物理学会秋季学術講演会（共同）)
339.	2014/09/17	反応性スパッタ法によるn型、並びにP型SnOx薄膜の作成 (第75回応用物理学会秋季学術講演会（共同）)
340.	2014/09/17	反応性スパッタ法の依るGaN薄膜のエピタキシャル成長 (第75回応用物理学会秋季学術講演会（共同）)
341.	2014/09/17	外部応力印加によるVO₂薄膜の相転移温度制御 (第75回応用物理学会秋季学術講演会（共同）)
342.	2014/09/17	金属・絶縁体相転移をまたぐVO₂薄膜の熱伝導率の温度依存性 (第75回応用物理学会秋季学術講演会（共同）)
343.	2014/03/19	分光エリプソメトリーによるITOナノ粒子のキャリア密度解析 (第61回応用物理学会春季学術講演会（共同）)
344.	2013/09/29	Observation on Thermal Conductivity Change of VO₂ Thin Film an Metal-semiconductor Transition (The 10th Asian Termophysical Properties Conference (ATPC2013)（共同）)
345.	2013/09/29	Thermal Diffusivity of WO_3-x Films Deposited by dc Reactive Magnetron Sputtering (The 10th Asian Termophysical Properties Conference (ATPC2013)（共同）)
346.	2013/09/29	Thermophysical Properties of Various TCO Films: ITO, IZO, AZO, and NTO films (The 10th Asian Termophysical Properties Conference (ATPC2013)（共同）)
347.	2013/09/17	Carrier transport in polycrystalline Al doped ZnO films (2013-JSAP-MRS Joint Symposia（共同）)
348.	2013/09/17	Deposition of VO₂ by Reactive Sputtering with Impedance Control System (2013-JSAP-MRS Joint Symposia（共同）)
349.	2013/09/17	Energy distribution of O-ions during the IGZO sputtering process (2013-JSAP-MRS Joint Symposia（共同）)
350.	2013/09/17	High-temperature durability of Ta doped SnO₂ films deposited by rf sputtering (2013-JSAP-MRS Joint Symposia（共同）)
351.	2013/09/17	In-free Transparent Conductive Films Deposited by Reactive Sputtering with a Sintered Metal Powder Target using Ne, Ar or Kr (2013-JSAP-MRS Joint Symposia（共同）)
352.	2013/09/17	Long-term durability on the electrical properties of various TAOS materials (2013-JSAP-MRS Joint Symposia（共同）)
353.	2013/09/17	Optical constants of transparent conductive Nb-doped TiO₂ films (2013-JSAP-MRS Joint Symposia（共同）)
354.	2013/09/17	The study on crystal growth of TiO₂ films deposited by reactive sputtering (2013-JSAP-MRS Joint Symposia（共同）)
355.	2013/09	Thermal transport properties of ITO, IZO, AZO, TTO and NTO films (2013-JSAP-MRS Joint Symposia（共同）)
356.	2013/07/10	Fabrication and characterization of Al doped ZnO films using reactive magnetron sputtering (The 12th International Symposium on Sputtering & Plasma processes(ISSP2013)（共同）)
357.	2013/05/13	Atomic forced microscopy and transmission electron microscopy observations on the early stages of Sn-doped In₂O₃₊ film growth deposited on a-SiO₂ Surface by dc magnetron sputtering (8th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics(TOEO-8)（共同）)
358.	2013/05/13	Comparative study on long-term durability of In-Zn-O, In-Zn-Ga-O and Zn-Sn-O films as TAOS (8th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics(TOEO-8)（共同）)
359.	2013/05/13	Crystal structures of TiO₂ films deposited by reactive sputtering under various deposition parameters (8th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics(TOEO-8)（共同）)
360.	2013/05/13	Electronic states of a-In-Zn-O films analyzed by x-ray photoelectron and reflected electron energy loss spectroscopies (8th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics(TOEO-8)（共同）)
361.	2013/05/13	In-situ analyses on the reactive sputtering process to deposit amorphous In₂O₃₊-ZnO films using an In-Zn alloy target (8th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics(TOEO-8)（共同）)
362.	2013/05/13	Nb-doped TiO₂ films deposited by reactive dc magnetron sputtering using Ni-Ti alloy target with impedence control systems (8th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics(TOEO-8)（共同）)
363.	2013/05/13	Optical constants of Nb-doped TiO₂ films analyzed by scanning ellipsometry (8th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics(TOEO-8)（共同）)
364.	2013/05/13	Optical, electrical and thermophysical properties of amorphous and polycrystalline WO_3+-x films deposited by dc reactive magnetron sputtering (8th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics(TOEO-8)（共同）)
365.	2013/05/13	Sputter deposition of Ta-doped SnO₂ films using various oxide targets (8th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics(TOEO-8)（共同）)
366.	2013/05/13	Ta-doped SnO₂ films deposited by reactive sputtering with a sintered Sn and Ta metal powder target using Ne, Ar or Kr (8th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics(TOEO-8)（共同）)
367.	2013/05/13	Thermal conductivity of VO₂ thin films across metal-semiconductor transition (8th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics(TOEO-8)（共同）)
368.	2013/05/13	Thermochromic VO₂ Films Deposited by Reactive DC Magnetron Sputtering Using a V-metal Target with Impedance Control Method (8th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics(TOEO-8)（共同）)
369.	2013/05/13	Transparent Conductive Al or Ga doped ZnO films deposited by off-axis sputtering (8th International Symposium on Transparent Oxide and Related Materials for Electronics and Optics(TOEO-8)（共同）)
370.	2012/10/21	Al-doped ZnO films deposited by reactive sputtering using slightly reduced buffer layer (4th International Symposium on Transparent Conductive Materials(TCM 2012)（共同）)
371.	2012/10/21	Amorphous Indium-Tin-Zinc-Oxide (a-ITZO) films deposited by DC sputtering with O₂, H₂O, N₂, oe N₂ introduction (4th International Symposium on Transparent Conductive Materials(TCM 2012)（共同）)
372.	2012/10/21	high quality Al or Ga doped ZnO films deposited by off-axis sputtering (4th International Symposium on Transparent Conductive Materials(TCM 2012)（共同）)
373.	2012/10/21	Nb-doped TiO₂ films deposited by reactive dc magnetron sputtering using Ni-Ti alloy target with impedance control systems (4th International Symposium on Transparent Conductive Materials(TCM 2012)（共同）)
374.	2012/10/21	Optical properties of polycrystalline or amorphous In₂O₃-based transparent conductive films (4th International Symposium on Transparent Conductive Materials(TCM 2012)（共同）)
375.	2012/10/21	Thermophysical properties of amorphous indium-gallium-zinc-oxide thin films (4th International Symposium on Transparent Conductive Materials(TCM 2012)（共同）)
376.	2012/10/03	In₂O₃系透明酸化物薄膜の熱拡散率とその温度依存性 (第33回日本熱物性シンポジウム（日本熱物性学会）（共同）)
377.	2012/10/03	酸化物薄膜と金属薄膜の界面熱抵抗に関する研究 (第33回日本熱物性シンポジウム（日本熱物性学会）（共同）)
378.	2012/09/11	O₂, H₂O, N₂, またはN₂O導入DCスパッタリング成膜アモルファスIn-Sn-Zn酸化物(a-ITZO)薄膜 (第73回応用物理学会学術講演会（共同）)
379.	2012/09/11	Off-axis スパッタ法による低比抵抗AZO, GZOの成膜 (第73回応用物理学会学術講演会（共同）)
380.	2012/09/11	アモルファスIZO薄膜の光学的バンドギャップの解析 (第73回応用物理学会学術講演会（共同）)
381.	2012/09/11	低比抵抗AlドープZnO(AZO)薄膜の成膜 (第73回応用物理学会学術講演会（共同）)
382.	2012/09/11	分光エリプソメトリによる多結晶ITO, アモルファスIZO薄膜の解析 (第73回応用物理学会学術講演会（共同）)
383.	2012/07/22	Fermi level shift of polycrystalline ITO and amorphous IZO thin films (The Twentieth Annual International Conference on Composites or Nano Engineering(ICCE)（共同）)
384.	2012/06/24	Electrochromic WO₃ Films Deposited by Hollow Cathode Gas Flow Sputtering with Very High Deposition Rate (9th International Conference on Coatings on Glass and Plastics(ICCG-9)（共同）)
385.	2012/06/24	High performance electrochromic WO₃ films deposited by hollow cathode gas flow sputtering (9th International Conference on Coatings on Glass and Plastics(ICCG9)（共同）)
386.	2012/06/24	How work function depends on carrier density and optical band gap various TCO films (9th International Conference on Coatings on Glass and Plastics(ICCG9)（共同）)
387.	2012/06/24	Nb-doped TiO2 films deposited by reactive dc magnetron sputtering using Ni-Ti alloy target (9th International Conference on Coatings on Glass and Plastics(ICCG9)（共同）)
388.	2012/06/24	Visible-light active photocatalytic Pt/WO₃ films deposited by hollow cathode gas flow sputtering (9th International Conference on Coatings on Glass and Plastics(ICCG9)（共同）)
389.	2012/04/09	Carrier Transport Properties of Sb- and Ta-doped SnO₂ (ATO and TTO) Films (2012 MRS Spring Meeting（共同）)
390.	2012/04/09	Comparative Study on Electrical and Optical Properties between Polycrystalline ITO, AZO and Amorphous IZO Films (2012 MRS Spring Meeting（共同）)
391.	2012/04/09	Experimental Observation of Fermi Level Shift in Aluminum Doped ZnO Films (2012 MRS Spring Meeting（共同）)
392.	2012/04/09	Nb-doped TiO₂ Films with Low Resistivity Deposited by Reactive dc Magnetron Sputtering with Impedance Control Systems (2012 MRS Spring Meeting（共同）)
393.	2012/04/09	Sputter Deposition of WO₃ Films as Visible Light-active Photocatalyst (2012 MRS Spring Meeting（共同）)
394.	2012/03/15	Investigation on Band –gap Shrinkage Phenomenon for ZnO:Al Films (第59回応用物理学会関係連合講演会（応用物理学会）（共同）)
395.	2012/03/15	ラマン分光法おうびカソードルミネッセンス法によるa-IGZO膜の構造評価 (第59回応用物理学会関係連合講演会（応用物理学会）（共同）)
396.	2012/03/15	様々な透明導電膜の熱物性 (第59回応用物理学会関係連合講演会（応用物理学会）（共同）)
397.	2011/12/19	Dependence of Film Thickness on Photocatalytic TiO₂ films Depositied by Rf Reactive Sputtering (The 21st MRS-Japan Academic Symposium（共同）)
398.	2011/12/19	Effects of Mesh on The Reactive Sputtering Process to Deposit TiNX and TiOX Films Using Ti Target (The 21st MRS-Japan Academic Symposium（共同）)
399.	2011/12/19	Electrical Properties and Structure of Amorphous Zn-Sn-O Films (The 21st MRS-Japan Academic Symposium（共同）)
400.	2011/12/19	Study on Polycrystalline WO₃ Films as Visible Light-active Photocatalyst (The 21st MRS-Japan Academic Symposium（共同）)
401.	2011/12/19	The Early Stages of ZnO, Al-doped ZnO, Ga-doped ZnO Films Deposited by dc magnetron sputtering (The 21st MRS-Japan Academic Symposium（共同）)
402.	2011/12/10	Amorphous Indium-Tin-Zinc-Oxide (a-ITZO) films deposited by DC sputtering using various reactive gases (The 1st E-MRS/MRS-J Bilateral Symposia（共同）)
403.	2011/11/21	3ω法によるアモルファルIGZO膜の熱伝導率測定 (第32回日本熱物性シンポジウム（日本熱物性学会）（共同）)
404.	2011/11/21	Al₂O₃/W多層膜における界面熱抵抗 (第32回日本熱物性シンポジウム（日本熱物性学会）（共同）)
405.	2011/11/21	TiO₂およびNbドープTiO₂薄膜の熱拡散率測定(2) (第32回日本熱物性シンポジウム（日本熱物性学会）（共同）)
406.	2011/11/21	アモルファスIGZO薄膜の熱拡散率測定 (第32回日本熱物性シンポジウム（日本熱物性学会）（共同）)
407.	2011/10/23	Effects of high energy particles bombarding on growing film surface during reactive sputtering deposition of TiN_x films (BIT’s 1st Annual World Congress of Nano-S&T（共同）)
408.	2011/10/23	Formation of nano-crystallites in amorphous Zn-Sn-O films as transparent oxide semiconductors (BIT’s 1st Annual World Congress of Nano-S&T（共同）)
409.	2011/10/23	Study on Shifted Fermi Level of indium-free Transparent Conductive Oxide (BIT’s 1st Annual World Congress of Nano-S&T（共同）)
410.	2011/10/23	Thermal properties of nano-size interface between oxide and metallic films -Thermal boundary resistance between Al₂O₃ and W films- (BIT’s 1st Annual World Congress of Nano-S&T（共同）)
411.	2011/09/21	Electrical Properties of New In-free Transparent Conductive Oxide Films; Nb-doped TiO₂ (E-MRS 2011 Fall Meeting（共同）)
412.	2011/09/21	Reactive Gas Flow-Sputter deposition of amorphous WO₃ Films for electrochromic devices (E-MRS 2011 Fall Meeting（共同）)
413.	2011/09/21	Sb-or Ta-doped SnO₂ (ATO or TTO) Films Deposited by Reactive Magnetron Sputtering (E-MRS 2011 Fall Meeting（共同）)
414.	2011/09/21	Study on Work Function of Al-doped ZnO Films Surface (E-MRS 2011 Fall Meeting（共同）)
415.	2011/09/21	Thermal Diffusivities of Amorphous Indium-Gallium-Zinc-Oxide (a-IGZO) Films (E-MRS 2011 Fall Meeting（共同）)
416.	2011/09/21	Thermophysical Properties of Pure and Nb-doped TiO₂ Films (E-MRS 2011 Fall Meeting（共同）)
417.	2011/09/21	Zn-Sn-O Films as Transparent Oxide Semiconductors Deposited by Sputtering (E-MRS 2011 Fall Meeting（共同）)
418.	2011/03/24	CT個体NMR法による光触媒表面へのアセトアルデヒドの吸着状態解析 (2011年度春季第58回応用物理学関連連合講演会（共同）)
419.	2011/03/24	ラマン分光法およびカソードルミネッセンス(CL)法によるa-IGZO膜評価 (2011年度春季第58回応用物理学関連連合講演会（共同）)
420.	2011/03/14	Carrier density dependence of work function for Al-doped ZnO(AZO) films (7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7)（共同）)
421.	2011/03/14	Characterization of a-IGZO Films by Raman Spectroscopy (7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7)（共同）)
422.	2011/03/14	Dependence of Total gas pressure on Thermal and Mechanical properties and Internal Structures in Indium Zinc Oxide Thin Films (7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7)（共同）)
423.	2011/03/14	Electrochromic Properties of Mg-doped NiO_x Thin Films Sputtered with H₂O Introduction (7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7)（共同）)
424.	2011/03/14	High Rate Deposition of Electrochromic WO₃ Films by Hollow Cathode Gas Flow Sputtering (7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7)（共同）)
425.	2011/03/14	High Rate Deposition of Ta-doped SnO₂(TTO) by Reactive Sputtering with Plasma Emission Intesity or Impedance Feedback systems (7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7)（共同）)
426.	2011/03/14	In-situ analyses on sputtered fragments in the reactive sputtering process to deposit amorphous IZO films using IZ target (7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7)（共同）)
427.	2011/03/14	In-situ analyses on the reactive sputtering process to deposit TiN_x films (7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7)（共同）)
428.	2011/03/14	In-situ analyses on the reactive sputtering processes to deposit AZO films using an Al-Zn alloy target (7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7)（共同）)
429.	2011/03/14	Photocatalytic activity of WO₃ films crystallized by post-annealing in air (7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7)（共同）)
430.	2011/03/14	Photocatalytic TiO₂ film depositied by rf reactive aputterin (7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7)（共同）)
431.	2011/03/14	Study on the initial film growth of ZnO transparent conductive films (7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7)（共同）)
432.	2011/03/14	Thermal boundary resistance between aluminum oxide and tungsten films (7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7)（共同）)
433.	2011/03/14	Thermal diffusivity measurement of TiO₂ and Nb-doped TiO₂ thin films (7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7)（共同）)
434.	2011/03/14	Thermophysical properties of Alq₃ and α-NPD films (7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7)（共同）)
435.	2011/03/14	Thermophysical properties of amorphous IGZO films deposited by dc magnetron sputtering (7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7)（共同）)
436.	2011/03/14	Transparent conductive Nb-doped TiO₂ films deposited by reactive dc magnetron sputtering with impedance control systems (7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7)（共同）)
437.	2011/03/14	Visible-light Active Photocatalytic WO₃ Films Deposited by Reactive Gas-Flow Sputtering (7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7)（共同）)
438.	2011/03/14	Zn-Sn-O films as transparent amorphous oxide semiconductors (7th International Symposium on Transparent Oxide Thin Films for Electronics and Optics(TOEO-7)（共同）)